This is an old revision of this page, as edited by Cmprince (talk | contribs) at 19:32, 18 June 2005 (copy: immersion not just for 193nm, +stub). The present address (URL) is a permanent link to this revision, which may differ significantly from the current revision.
Revision as of 19:32, 18 June 2005 by Cmprince (talk | contribs) (copy: immersion not just for 193nm, +stub)(diff) ← Previous revision | Latest revision (diff) | Newer revision → (diff)In photolithography, immersion lithography is a variant technique that interposes a liquid medium between the optics and the wafer surface, replacing the usual air gap. With the 193 nm wavelength, the typical liquid used is ultra-pure, degassed water. Immersion lithography increases the effective depth-of-focus for a given numerical aperture and permits the use of optics with numerical apertures above 1.0, thus raising the maximum resolution potential of extant wavelength technologies. Immersion techniques may help extend the use of the 193 nm wavelength to the 45 nm feature size node and beyond.
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