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			{{Short description|Ceramic material}}
			{{redirect|TiN|the chemical element|Tin}}
	{{chembox		{{chembox
			| Verifiedfields = changed
⚫	| verifiedrevid = 416234382
			| Watchedfields = changed
		⚫	| verifiedrevid = 449174994
	| Name = Titanium nitride		| Name = Titanium nitride
	| ImageFile = NaCl polyhedra.png		| ImageFile = File:Titanium nitride TiN.jpg
			| ImageAlt = Brown powdered titanium nitride
			| ImageSize = 280
			| ImageFile2 = Titanium-nitride-crystal-3D-vdW.png
			| ImageAlt2 = The structure of sodium chloride; titanium nitride's structure is similar.
	| IUPACName = Titanium nitride		| IUPACName = Titanium nitride
	| OtherNames =		| OtherNames = Titanium(III) nitride
	| Section1 = {{Chembox Identifiers		| Section1 = {{Chembox Identifiers
	| CASNo = 25583-20-4		| CASNo = 25583-20-4
	| CASNo_Ref = {{cascite|correct|CAS}}		| CASNo_Ref = {{cascite|correct|CAS}}
			| UNII_Ref = {{fdacite|correct|FDA}}
	| PubChem =
			| UNII = 6RW464FEFF
⚫	| ChemSpiderID_Ref = {{chemspidercite|correct|chemspider}}
	| ChemSpiderID =		| PubChem = 93091
		⚫	| ChemSpiderID_Ref = {{chemspidercite|changed|chemspider}}
			| ChemSpiderID = 84040
	| RTECS =		| RTECS =
			| EINECS = 247-117-5
			| InChI = 1S/N.Ti
			| SMILES = N#
	}}		}}
	| Section2 = {{Chembox Properties		| Section2 = {{Chembox Properties
	| Formula = TiN		| Formula = TiN
	| MolarMass = 61.874 g/mol		| MolarMass = 61.874 g/mol
	| Appearance = Coating of golden color		| Appearance = Brown as a pure solid, coating of golden color
	| Odor = Odorless		| Odor = Odorless
	| Solubility = None		| Solubility = insoluble
	| Solvent1 =
	| Solubility1 =
	| Solvent2 =
	| Solubility2 =
	| SolubleOther =		| SolubleOther =
			| Density = 5.21 g/cm<sup>3</sup><ref name=crc>{{cite book |editor-last=Haynes |editor-first=William M. |year=2016 |title=CRC Handbook of Chemistry and Physics |edition=97th |page=4.92 |publisher=] |isbn=9781498754293 |title-link=CRC Handbook of Chemistry and Physics}}</ref>
	| Density = 5.40 g/cm<sup>3</sup>
	| MeltingPt = 2930 °C		| MeltingPtC = 2947
			| MeltingPt_ref= <ref name=crc/>
			| ThermalConductivity = 29&nbsp;W/(m·K) (323&nbsp;K)<ref name=th2/>
			| MagSus = +38{{e|-6}} emu/mol
	| BoilingPt =		| BoilingPt =
	| RefractIndex =		| RefractIndex =
	}}		}}
	| Section3 = {{Chembox Structure		| Section3 = {{Chembox Structure
			| Structure_ref=<ref>{{cite journal |last=Lengauer |first=Walter |year=1992 |title=Properties of bulk δ-TiN<sub>1−x</sub> prepared by nitrogen diffusion into titanium metal |journal=Journal of Alloys and Compounds |volume=186 |issue=2 |pages=293–307 |doi=10.1016/0925-8388(92)90016-3}}</ref>
	| CrystalStruct = ], ]		| CrystalStruct = ] (FCC), ]
	| SpaceGroup = Fm<u style="text-decoration:overline">3</u>m, No. 225		| SpaceGroup = Fm<u style="text-decoration:overline">3</u>m, No. 225
	| Coordination = Octahedral		| Coordination = Octahedral
	| LattConst_a =		| LattConst_a = 0.4241 nm
			| UnitCellFormulas =4
	}}		}}
			| Section4 = {{Chembox Thermochemistry
			| Thermochemistry_ref =
			| HeatCapacity = 24 J/(K·mol) (500 K)<ref name=th2>{{cite journal |last1=Lengauer |first1=W. |last2=Binder |first2=S. |last3=Aigner |first3=K. |last4=Ettmayer |first4=P. |last5=Guillou |first5=A. |last6=de&nbsp;Buigne |first6=J. |last7=Groboth |first7=G. |year=1995 |title=Solid state properties of group IV‑b carbonitrides |journal=Journal of Alloys and Compounds |volume=217 |pages=137–147 |doi=10.1016/0925-8388(94)01315-9}}</ref>
			| Entropy = −95.7 J/(K·mol)<ref name=th1>{{cite journal |last=Wang |first=Wei-E |year=1996 |title=Partial thermodynamic properties of the Ti-N system |journal=Journal of Alloys and Compounds |volume=233 |issue=1–2 |pages=89–95 |doi=10.1016/0925-8388(96)80039-9}}</ref>
			| DeltaHform = −336 kJ/mol<ref name=th1/>
			| DeltaGfree =
			| DeltaHcombust =
			| DeltaHfus =
			| DeltaHvap =
			| DeltaHsublim =
			| HHV =
			| LHV =
			}}
			| Section8 = {{Chembox Related
			| OtherFunction = ]
			| OtherFunction_label = coating
	}}		}}
			}}
		⚫	'''Titanium nitride''' ('''TiN'''; sometimes known as '''tinite''') is an extremely hard ] material, often used as a ] (PVD) coating on ]s, ], ], and ] components to improve the substrate's surface properties.
		⚫	Applied as a thin coating, TiN is used to harden and protect cutting and sliding surfaces, for decorative purposes (for its golden appearance), and as a non-toxic exterior for ]. In most applications a coating of less than {{nowrap| {{convert|5|um|in}} }} is applied.<ref>{{Cite web |title=TiN (Titanium Nitride) – Surface Coating |url=http://www.surftech.com.au/coating-types/tin/ |access-date=2024-02-17 |language=en-US}}</ref>
⚫	'''Titanium nitride''' ({{titanium}}{{nitrogen}}) (sometimes known as “Tinite” or “TiNite” or “TiN”) is an extremely hard ] material, often used as a coating on ]s, ], ], and ] components to improve the substrate's surface properties.
⚫	Applied as a thin coating, TiN is used to harden and protect cutting and sliding surfaces, for decorative purposes (due to its gold appearance), and as a non-toxic exterior for ]. In most applications a coating of less than {{convert|5|um|in}} is applied.
	==Characteristics==		==Characteristics==
	Summary of characteristics<ref name=prop>{{cite book|page=193|url=http://books.google.com/?id=pbt-RWodmVAC&pg=PA193|title=Handbook of refractory carbides and nitrides: properties, characteristics, processing, and applications|author =Hugh O. Pierson| publisher = William Andrew|year =1996| isbn= 0815513925}}</ref><ref>{{cite journal |doi=10.1116/1.577270 |first=D. S. |last=Stone |coauthors=K. B. Yoder; W. D. Sproul |title=Hardness and elastic modulus of TiN based on continuous indentation technique and new correlation |journal=Journal of Vacuum Science and Technology A |volume=9 |issue=4 |year=1991 |pages=2543–2547}}</ref>		TiN has a ] of 1800–2100, hardness of {{val|31|4|u=GPa}},<ref name=":0" /> a ] of {{val|550|50|u=GPa}},<ref name=":0" /> a ] of 9.35{{e|-6}}&nbsp;K<sup>−1</sup>, and a superconducting transition temperature of 5.6&nbsp;K.<ref name=prop>{{cite book |editor-first=Hugh O. |editor-last=Pierson |year=1996 |title=Handbook of Refractory Carbides and Nitrides: Properties, characteristics, processing, and applications |publisher=William Andrew |isbn=978-0-8155-1392-6 |page=193 |via=Google Books |url=https://books.google.com/books?id=pbt-RWodmVAC&pg=PA193}}</ref><ref name=":0">{{cite journal |doi=10.1116/1.577270 |first1=D. S. |last1=Stone |first2=K. B. |last2=Yoder |first3=W. D. |last3=Sproul |year=1991 |title=Hardness and elastic modulus of TiN based on continuous indentation technique and new correlation |journal=Journal of Vacuum Science and Technology A |volume=9 |issue=4 |pages=2543–2547 |bibcode=1991JVSTA...9.2543S |doi-access=free }}</ref>
	*] 18-21 GPa
	*] 251 GPa
	*] 19.2 W/(m·°C)
	*] 9.35×10<sup>−6</sup> K<sup>−1</sup>
	*Superconducting transition temperature 5.6 K
	*] +38×10<sup>−6</sup> emu/mol
	TiN will oxidize at 800 °C at normal atmosphere. It is chemically stable at room temperature and is attacked by hot concentrated acids.<ref name=prop/>
	TiN has excellent ] (IR) ] properties, reflecting in a spectrum similar to elemental ] (Au), which gives it a yellowish color. Depending on the substrate material and surface finish, TiN will have a ] ranging from 0.4 to 0.9 versus itself (non-lubricated). Typical formation has a ] of ] with a roughly 1:1 ]; however TiN<sub>x</sub> compounds with ''x'' ranging from 0.6 to 1.2 are thermodynamically stable.<ref>{{cite book |first=L.E. |last=Toth |title=Transition Metal Carbides and Nitrides |publisher=Academic Press |location=New York |year=1971 |isbn=0126959501}}</ref> A thin film of titanium nitride was chilled to near ] converting it into the first known ], with resistance suddenly increased by a factor of 100,000.<ref>{{cite news |url=http://www.physorg.com/news126797387.html |title=Newly discovered 'superinsulators' promise to transform materials research, electronics design |work=PhysOrg.com |date=2008-04-07}}</ref>		TiN oxidizes at 800&nbsp;°C in a normal atmosphere. It is chemically stable at 20&nbsp;°C, according to laboratory tests, but can be slowly attacked by concentrated acid solutions with rising temperatures.<ref name=prop/> TiN has a brown color and appears gold when applied as a coating. Depending on the substrate material and surface finish, TiN has a ] ranging from 0.4 to 0.9 against another TiN surface (non-lubricated). The typical TiN formation has a ] of ] with a roughly 1:1 ]; TiN<sub>''x''</sub> compounds with ''x'' ranging from 0.6 to 1.2 are, however, thermodynamically stable.<ref>{{cite book |first=L. E. |last=Toth |year=1971 |title=Transition Metal Carbides and Nitrides |publisher=Academic Press |location=New York, NY |isbn=978-0-12-695950-5}}</ref>
			TiN becomes ] at cryogenic temperatures, with critical temperature up to 6.0&nbsp;K for single crystals.<ref>{{cite journal |last1=Spengler |first1=W. |display-authors=etal |year=1978 |title=Raman scattering, superconductivity, and phonon density of states of stoichiometric and nonstoichiometric TiN |journal=Physical Review B |volume=17 |issue=3 |pages=1095–1101 |doi=10.1103/PhysRevB.17.1095 |bibcode=1978PhRvB..17.1095S}}</ref> Superconductivity in thin-film TiN has been studied extensively, with the superconducting properties strongly varying depending on sample preparation, up to complete suppression of superconductivity at a ].<ref>{{cite journal |last1=Baturina |first1=T. I. |display-authors=etal |year=2007 |title=Localized superconductivity in the quantum-critical region of the disorder-driven superconductor-insulator transition in TiN thin films |journal=Physical Review Letters |volume=99 |issue=25 |pages=257003 |pmid=18233550 |arxiv=0705.1602 |doi=10.1103/PhysRevLett.99.257003 |bibcode=2007PhRvL..99y7003B |s2cid=518088}}</ref> A thin film of TiN was chilled to near ], converting it into the first known ], with resistance suddenly increasing by a factor of 100,000.<ref>{{cite news |title=Newly discovered 'superinsulators' promise to transform materials research, electronics design |date=2008-04-07 |website=PhysOrg.com |url=http://www.physorg.com/news126797387.html}}</ref>
			==Natural occurrence==<!--Osbornite redirects here-->
			] is a very rare natural form of titanium nitride, found almost exclusively in meteorites.<ref>{{cite web |title=Osbornite |publisher=Hudson Institute of Mineralogy |website=Mindat.org |url=http://www.mindat.org/min-3035.html |access-date=Feb 29, 2016}}</ref><ref>{{cite web |title=Osbornite mineral data |date=Sep 5, 2012 |website=Mineralogy Database |publisher=David Barthelmy |url=http://webmineral.com/data/Osbornite.shtml#.V_cFauArJaQ |access-date=Oct 6, 2015}}</ref>
	==Uses==		==Uses==
	]		{{Multiple image|total_width=160 |align=left |image1=Titanium nitride coating.jpg |caption1=TiN-coated drill bit |image2=Paraframe.jpg |caption2=Dark gray TiCN coating on a ] pocketknife}}
		⚫	A well-known use for TiN coating is for edge retention and corrosion resistance on machine tooling, such as ]s and ]s, often improving their lifetime by a factor of three or more.<ref>{{cite web |title=Titanium Nitride (TiN) Coating |date=June 2014 |publisher=Surface Solutions |url=http://www.tincoat.net/TiN.html
	] pocketknife]]
			}}</ref>
⚫	A well-known use for TiN coating is for edge retention and corrosion resistance on machine tooling, such as ]s and ]s, often improving their lifetime by a factor of three or more.<!-- It would be helpful to have a reference here to back up this claim. -->
	Because of TiN's metallic gold color, it is used to coat ] and automotive trim for decorative purposes. TiN is also widely used as a top-layer coating, usually with ] (Ni) or ] (Cr) plated substrates, on consumer plumbing fixtures and door hardware. As a coating it is used in ] and military applications and to protect the sliding surfaces of ] forks of ]s and ]s as well as the shock shafts of ]s. TiN is non-toxic, meets ] guidelines and has seen use in ]s such as ] blades and orthopedic ] blades where sharpness and edge retention are important<ref>{{cite web |url=http://www.ionfusion.com/products.htm |title=Products |publisher=IonFusion Surgical |accessdate=2009-06-25}}</ref>. TiN coatings have also been used in implanted ] (especially ] implants) and other medical implants.		Because of the metallic gold color of TiN, this material is used to coat ] and automotive trim for decorative purposes. TiN is also widely used as a top-layer coating, usually with ]- or ]-plated substrates, on consumer plumbing fixtures and door hardware. As a coating, it is used in ] and military applications and to protect the sliding surfaces of ] forks of ]s and ]s, as well as the shock shafts of ]s. TiN is also used as a protective coating on the moving parts of many rifles and semi-automatic firearms, as it is extremely durable. As well as being durable, it is also extremely smooth, making removing the carbon build-up extremely easy. TiN is non-toxic, meets ] guidelines,<ref>{{cite web |url=https://www.accessdata.fda.gov/cdrh_docs/pdf2/k022795.pdf |title=Titanium-Nitride Coating Special |website=Food and Drug Administration |date=Aug 21, 2002 |access-date=Sep 22, 2024}}</ref> and has seen use in ]s such as ] blades and orthopedic ] blades, where sharpness and edge retention are important.<ref>{{cite web |url=https://www.sputtertargets.net/blog/titanium-nitride-overview-properties-production-and-uses.html |title=Titanium Nitride Overview: Properties, Production, and Uses |last=Green |first=Julissa |date=Feb 23, 2024 |website=Sputter Targets |access-date=Sep 22, 2024}}</ref> TiN coatings have also been used in implanted ] (especially ] implants) and other medical implants.
	Though less visible, ]s of TiN are also used in ], where they serve as ] ] between the active device and the metal contacts used to operate it. While the film blocks ] of metal into the silicon, it is conductive enough (30–70 μ]·cm) to allow a good electrical connection. In this context, TiN is classified as a "]", even though it is clearly a ] from the perspective of ] or mechanical behavior. Recent chip design in the 45&nbsp;nm technology and beyond also makes use of TiN as a ''metal'' material for improved ] performance. In combination with ]s (e.g. HfSiO) that have a higher ] compared to standard ] the gate length can be scaled down with low ], higher drive current and same or better ].<ref>{{cite journal |first=Thaddeus G. |last=Dziura |coauthors=Benjamin Bunday; Casey Smith; Muhammad M. Hussain; Rusty Harris; Xiafang Zhang; Jimmy M. Price |title=Measurement of high-k and metal film thickness on FinFET sidewalls using scatterometry |journal=Proceedings of SPIE |publisher=International Society for Optical Engineering |volume=6922 |issue=2 |page=69220V |year=2008 |doi=10.1117/12.773593}}</ref>		Though less visible, ]s of TiN are also used in ], where they serve as a ] connection between the active device and the metal contacts used to operate the circuit, while acting as a ] to block the ] of the metal into the silicon. In this context, TiN is classified as a "barrier metal" (electrical resistivity ~ 25&nbsp;μΩ·cm<ref name=th2/>), even though it is clearly a ] from the perspective of ] or mechanical behavior. Recent chip design in the 45&nbsp;nm technology and beyond also makes use of TiN as a "metal" for improved ] performance. In combination with ]s (e.g. ]) that have a higher ] compared to standard ], the gate length can be scaled down with low ], higher drive current and the same or better ].<ref>{{cite journal |first1=Thaddeus G. |last1=Dziura |first2=Benjamin |last2=Bunday |first3=Casey |last3=Smith |first4=Muhammad M. |last4=Hussain |first5=Rusty |last5=Harris |first6=Xiafang |last6=Zhang |first7=Jimmy M. |last7=Price |year=2008 |title=Measurement of high-''k'' and metal film thickness on FinFET sidewalls using scatterometry |journal=Proceedings of SPIE |volume=6922 |issue=2 |page=69220V |doi=10.1117/12.773593 |series=Metrology, Inspection, and Process Control for Microlithography XXII |bibcode=2008SPIE.6922E..0VD |s2cid=120728898}}</ref> Additionally, TiN thin films are currently under consideration for coating ]s for accident-tolerant nuclear fuels.<ref>{{Cite journal |last1=Tunes |first1=Matheus A. |last2=da&nbsp;Silva |first2=Felipe C. |last3=Camara |first3=Osmane |last4=Schön |first4=Claudio G. |last5=Sagás |first5=Julio C. |last6=Fontana |first6=Luis C. |last7=Donnelly |first7=Stephen E. |last8=Greaves |first8=Graeme |last9=Edmondson |first9=Philip D. |display-authors=6 |date=December 2018 |title=Energetic particle irradiation study of TiN coatings: are these films appropriate for accident tolerant fuels? |journal=Journal of Nuclear Materials |volume=512 |pages=239–245 |doi=10.1016/j.jnucmat.2018.10.013 |bibcode=2018JNuM..512..239T |url=https://pure.hud.ac.uk/ws/files/14781227/preprint_TiN.pdf}}</ref><ref>{{Cite journal |last1=Alat |first1=Ece |last2=Motta |first2=Arthur T. |last3=Comstock |first3=Robert J. |last4=Partezana |first4=Jonna M. |last5=Wolfe |first5=Douglas E. |date=September 2016 |title=Multilayer (TiN, TiAlN) ceramic coatings for nuclear fuel cladding |journal=Journal of Nuclear Materials |volume=478 |pages=236–244 |doi=10.1016/j.jnucmat.2016.05.021 |doi-access=free |bibcode=2016JNuM..478..236A}}</ref> It is also used as a coating on some ] diaphragms to improve performance.
	Due to their high biostability, TiN layers may also be used as electrodes in ] <ref name= SCT2010>{{cite journal | author = M. Birkholz, K.-E. Ehwald, D. Wolansky, I. Costina, C. Baristyran-Kaynak, M. Fröhlich, H. Beyer, A. Kapp, F. Lisdat | title = Corrosion-resistant metal layers from a CMOS process for bioelectronic applications | journal = Surf. Coat. Technol. | volume = 204 | pages = 2055–2059 | year = 2010 | doi = 10.1016/j.surfcoat.2009.09.075 | url=http://www.mariobirkholz.de/SCT2010.pdf}}</ref> like in intelligent ] or in-vivo ] that have to withstand the severe corrosion caused by the ]. TiN electrodes have already been applied in the ] <ref name= Haem2002>{{cite journal | author = H. Hämmerle, K. Kobuch, K. Kohler, W. Nisch, H. Sachs, M. Stelzle, | title = Biostability of micro-photodiode arrays for subretinal implantation| journal = Biomat. | volume = 23 | pages = 797–804 | year = 2002 | doi = 10.1016/S0142-9612(01)00185-5}} </ref> as well as in biomedical microelectromechanical systems (]).<ref name= AdFM2011>{{cite journal | author = M. Birkholz, K.-E. Ehwald, P. Kulse, J. Drews, M. Fröhlich, U. Haak, M. Kaynak, E. Matthus, K. Schulz, D. Wolansky | title = Ultrathin TiN membranes as a technology platform for CMOS-integrated MEMS and BioMEMS devices | journal = Adv. Func. Mat. | volume = 21 | pages = 1652–1654 | year = 2011 | doi = 10.1002/adfm.201002062 }}</ref>		Owing to their high biostability, TiN layers may also be used as electrodes in ]<ref name= SCT2010>{{cite journal | last1 = Birkholz | first1 = M. | last2 = Ehwald | first2 = K.-E. | last3 = Wolansky | first3 = D. | last4 = Costina | first4 = I. | last5 = Baristiran-Kaynak | first5 = C. | last6 = Fröhlich | first6 = M. | last7 = Beyer | first7 = H. | last8 = Kapp | first8 = A. | last9 = Lisdat | first9 = F. |display-authors=6 | year = 2010 | title = Corrosion-resistant metal layers from a CMOS process for bioelectronic applications | journal = Surf. Coat. Technol. | volume = 204 | issue = 12–13 | pages = 2055–2059 | doi = 10.1016/j.surfcoat.2009.09.075 | url = https://www.researchgate.net/publication/230817001}}</ref> like in intelligent ] or in-vivo ] that have to withstand the severe corrosion caused by ]s. TiN electrodes have already been applied in the ]<ref name= Haem2002>{{cite journal | last1 = Hämmerle | first1 = Hugo | last2 = Kobuch | first2 = Karin | last3 = Kohler | first3 = Konrad | last4 = Nisch | first4 = Wilfried | last5 = Sachs | first5 = Helmut | last6 = Stelzle | first6 = Martin | year = 2002 | title = Biostability of micro-photodiode arrays for subretinal implantation | journal = Biomaterials | volume = 23 | issue = 3 | pages = 797–804 | doi = 10.1016/S0142-9612(01)00185-5 | pmid = 11771699}}</ref> as well as in biomedical microelectromechanical systems (]).<ref name= AdFM2011>{{cite journal | last1 = Birkholz | first1 = M. | last2 = Ehwald | first2 = K.-E. | last3 = Kulse | first3 = P. | last4 = Drews | first4 = J. | last5 = Fröhlich | first5 = M. | last6 = Haak | first6 = U. | last7 = Kaynak | first7 = M. | last8 = Matthus | first8 = E. | last9 = Schulz | first9 = K. | last10 = Wolansky | first10 = D. |display-authors=6 | year = 2011 | title = Ultrathin TiN membranes as a technology platform for CMOS-integrated MEMS and BioMEMS devices | journal = Advanced Functional Materials | volume = 21 | issue = 9 | pages = 1652–1654 | doi = 10.1002/adfm.201002062 | doi-access = free }}</ref>
	==Fabrication==		==Fabrication==
	]		]
	The most common methods of TiN thin film creation are ] (PVD, usually ], ] or ]) and ] (CVD). In both methods, pure titanium is ] and reacted with nitrogen in a high-energy, ] environment. TiN film may also be produced on Ti workpieces by reactive growth (for example, ]) in a ] atmosphere. PVD is preferred for steel parts because the deposition temperatures exceeds the ] temperature of steel. TiN layers are also sputtered on a variety of higher melting point materials such as ]s, ] and titanium alloys.<ref>{{cite web |url=http://www.mmicoating.com/technology.html |title=Specialties |publisher=Molecular Metallurgy, Inc |accessdate=2009-06-25}}</ref> Its high ] (values between 450 and 590 ] have been reported in the literature <ref name= SCT2008>{{cite journal | author = G. Abadias, | title = Stress and preferred orientation in nitride based PVD coatings | journal = Surf. Coat. Technol. | volume = 202 | pages = 2223-2235 | year = 2008 | doi = 10.1016/j.surfcoat.2007.08.029}} </ref>) means that thick coatings tend to flake away, making them much less durable than thin ones. Titanium nitride coatings can also be deposited by ] whereas TiN powders are produced by nitridation of titanium with nitrogen or ammonia at 1200 °C.<ref name=prop/>		The most common methods of TiN thin film creation are ] (PVD, usually ], ] or ]) and ] (CVD).<ref>{{cite web |url=http://www.diffusion-alloys.com/our-services/wear-coatings-for-industrial-products/ |title=Wear coatings for industrial products |publisher=Diffusion Alloys |access-date=2013-06-14 |url-status=dead |archive-url=https://web.archive.org/web/20130519024447/http://www.diffusion-alloys.com/our-services/wear-coatings-for-industrial-products/ |archive-date=2013-05-19}}</ref> In both methods, pure titanium is ] and reacted with nitrogen in a high-energy, ] environment. TiN film may also be produced on Ti workpieces by reactive growth (for example, ]) in a ] atmosphere. PVD is preferred for steel parts because the deposition temperatures exceeds the ] temperature of steel. TiN layers are also sputtered on a variety of higher-melting-point materials such as ]s, ] and ]s.<ref>{{cite web |title=Coatings |publisher=Coating Services Group |url=http://coatingservicesgroup.com/coatings |access-date=2009-06-25}}</ref> Its high ] (values between 450 and 590&nbsp;] have been reported in the literature<ref name= SCT2008>{{cite journal | last = Abadias | first = G. | year = 2008 | title = Stress and preferred orientation in nitride based PVD coatings | journal = Surf. Coat. Technol. | volume = 202 | issue = 11 | pages = 2223–2235 | doi = 10.1016/j.surfcoat.2007.08.029}}</ref>) means that thick coatings tend to flake away, making them much less durable than thin ones. Titanium-nitride coatings can also be deposited by ] whereas TiN powders are produced by nitridation of titanium with nitrogen or ammonia at 1200&nbsp;°C.<ref name=prop/>
	Bulk ceramic objects can be fabricated by packing powdered metallic titanium into the desired shape, compressing it to the proper density, then igniting it in an atmosphere of pure nitrogen. The heat released by the chemical reaction between the metal and gas is sufficient to ] the nitride reaction product into a hard, finished item. See ].		Bulk ceramic objects can be fabricated by packing powdered metallic titanium into the desired shape, compressing it to the proper density, then igniting it in an atmosphere of pure nitrogen. The heat released by the chemical reaction between the metal and gas is sufficient to ] the nitride reaction product into a hard, finished item. See ].
	==Other commercial variants==		==Other commercial variants==
	]		]
⚫	There are several commercially-used variants of TiN that have been developed in the past decade, such as titanium carbon nitride (TiCN), ] (TiAlN or AlTiN), and titanium aluminum carbon nitride, which may be used individually or in alternating layers with TiN. These coatings offer similar or superior enhancements in corrosion resistance and hardness, and additional colors ranging from light gray to nearly black, to a dark ] bluish-purple depending on the exact process of application. These coatings are becoming common on sporting goods, particularly ] and ]s, where they are used for both cosmetic and functional reasons.<ref>{{cite web |url=http://www.mmicoating.com/product.html |title=Product Guide |publisher=Molecular Metallurgy, Inc |accessdate=2009-06-25}}</ref>
		⚫	There are several commercially used variants of TiN that have been developed since 2010, such as titanium carbon nitride (TiCN), ] (TiAlN or AlTiN), and titanium aluminum carbon nitride, which may be used individually or in alternating layers with TiN. These coatings offer similar or superior enhancements in corrosion resistance and hardness, and additional colors ranging from light gray to nearly black, to a dark, ], bluish-purple, depending on the exact process of application. These coatings are becoming common on sporting goods, particularly ] and ]s, where they are used for both aesthetic and functional reasons.
⚫	==As a constituent in steel making==
		⚫	==As a constituent in steel==
	Titanium nitride is also produced intentionally within some steels by judicious addition of titanium to the ]. TiN forms at very high temperatures because of its very low ], and even ] directly from the melt in secondary steelmaking. It forms discrete, micrometre-sized ] particles at ] and triple points, and prevents ] by ] up to very high ]s. Titanium nitride has the lowest ] of any metal nitride or carbide in austenite, a useful attribute in ] formulas.		Titanium nitride is also produced intentionally, within some steels, by judicious addition of titanium to the ]. TiN forms at very high temperatures because of its very low ], and even ] directly from the melt in secondary steel-making. It forms discrete, micrometre-sized ] particles at ] and triple points, and prevents ] by ] up to very high ]s. Titanium nitride has the lowest ] of any metal nitride or carbide in austenite, a useful attribute in ] formulas.
	==References==		==References==
	{{reflist|2}}		{{reflist|25em}}
	{{Titanium compounds}}		{{Titanium compounds}}
			{{Nitrides}}
			{{Authority control}}
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	]		]
			]
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	]
	]
	]
	]
	]
	]
	]
	]
	]