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A remote plasma (also downstream plasma or afterglow plasma) is a plasma processing method in which the plasma and material interaction occurs at a location remote from the plasma in the plasma afterglow.

See also

• Chemical vapor deposition
• Corona treatment
• Physical vapor deposition
• Plasma activation
• Plasma chemistry
• Plasma cleaning
• Plasma-activated bonding
• Reactive ion etching

References

1. Tommi Kääriäinen; David Cameron; Marja-Leena Kääriäinen; Arthur Sherman (17 May 2013). Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications. Wiley. pp. 21–. ISBN 978-1-118-74742-1.
2. Alexander Fridman (5 May 2008). Plasma Chemistry. Cambridge University Press. pp. 532–. ISBN 978-1-139-47173-2.

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