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Trifluorosilane

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Trifluorosilane
Names
IUPAC name Trifluorosilane
Identifiers
CAS Number
3D model (JSmol)
ChemSpider
PubChem CID
CompTox Dashboard (EPA)
InChI
  • InChI=1S/F3HSi/c1-4(2)3/h4HKey: WPPVEXTUHHUEIV-UHFFFAOYSA-N
  • InChI=1S/F3HSi/c1-4(2)3/h4HKey: ZDHXKXAHOVTTAH-UHFFFAOYAH
SMILES
  • F(F)F
Properties
Chemical formula HF3Si
Molar mass 86.09 g/mol
Appearance Colorless gas
Density 1.86 g/cm
Melting point −131 °C (−204 °F; 142 K)
Boiling point −97.5 °C (−143.5 °F; 175.7 K)
Except where otherwise noted, data are given for materials in their standard state (at 25 °C , 100 kPa). Infobox references
Chemical compound

Trifluorosilane is the chemical compound with the formula F3HSi. At standard temperature and pressure, trifluorosilane is a colorless gas. Note that the free radical F3Si is often also referred to as trifluorosilane, although more properly referred to as trifluorosilyl.

Preparation

Trifluorosilane has been purified and separated by low-temperature high-vacuum distillation. One preparation method involves products of the reaction between SbF3 and HSiCl3. HSiCl3 is obtained by copper catalyzed reaction between HCl and Silicon at 200-400 °C.

Formation has also been reported in certain etching operations of silicon.

Properties

The electric dipole moment of trifluorosilane is 1.26 debye. The length of the silicon to fluorine bond is 1.555 Å, Si-H length is 1.55 Å, and ∠FSiF is 110°.

References

  1. Perry, Dale L. (2011-06-15). Handbook of Inorganic Compounds, Second Edition. CRC Press. ISBN 9781439814628.
  2. Zuckerman, J. J. (2009-09-17). Inorganic Reactions and Methods, The Formation of Bonds to Halogens. John Wiley & Sons. ISBN 9780470145388.
  3. Lippold, Marcus; Böhme, Uwe; Gondek, Christoph; Kronstein, Martin; Patzig-Klein, Sebastian; Weser, Martin; Kroke, Edwin (December 2012). "Etching Silicon with HF-HNO 3 -H 2 SO 4 /H 2 O Mixtures - Unprecedented Formation of Trifluorosilane, Hexafluorodisiloxane, and Si-F Surface Groups". European Journal of Inorganic Chemistry. 2012 (34): 5714–5721. doi:10.1002/ejic.201200674. ISSN 1434-1948. Retrieved 2014-08-27.
  4. Ghosh, S. N.; Trambarulo, Ralph; Gordy, Walter (February 1953). "Electric Dipole Moments of Several Molecules from the Stark Effect". The Journal of Chemical Physics. 21 (2): 308–310. Bibcode:1953JChPh..21..308G. doi:10.1063/1.1698877.
  5. Sheridan, John; Gordy, Walter (1 March 1950). "Microwave Spectra and Molecular Constants of Trifluorosilane Derivatives. Si F 3 H, Si F 3 C H 3 , Si F 3 Cl, and Si F 3 Br". Physical Review. 77 (5): 719. Bibcode:1950PhRv...77..719S. doi:10.1103/PhysRev.77.719.

Further reading

  • Demaison, J.; Margulès, L.; Breidung, J.; Thiel, W.; Bürger, H. (10 November 1999). "Ab initio anharmonic force field, spectroscopic parameters and equilibrium structure of trifluorosilane". Molecular Physics. 97 (9): 1053–1067. Bibcode:1999MolPh..97.1053D. doi:10.1080/00268979909482906.
Silicon compounds
Si(II)
Si(III)
Si(IV)
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